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International EUV Symposium: Intel on EUV Commercialization. CaF is still more expensive than gold
Peter Silverman, head of Intel’s capital lithographic equipment division and one of the participants in the international symposium on the implementation and development of EUV (extreme ultraviolet) equipment – International EUV Symposium, in his keynote speech shared his thoughts on the prospects for the implementation of EUV equipment. Here are some quick points:
Before talking about commercial use of EUV equipment, EUV scanners need to achieve a throughput of about 120 plates per hour. Today’s prototypes have a peak processing capacity of up to 90 wafers per hour, and with service time taken into account, about 60 wafers per hour
The industry would like the price of EUV scanners at the level of $ 20 million. apiece, meanwhile, experts expect a price level of $ 50 million. and even higher. In addition, the cost of photo masks is also increasing immeasurably
The commercial operation of EUV systems is expected to begin in 2021, when Intel and other companies plan to move to production standards with nodes of the order of 45 nm. Thus, ready-made EUV beta installations should appear in 2021
Optimism about the successful advancement of the development of EUV lithography equipment with 13.5 nm lasers is somewhat overshadowed by the deterioration of the general economic situation in the world. It is possible that by the time ready-made EUV systems appear, some processor and memory manufacturers will not be able to afford the purchase of such equipment
According to preliminary estimates, work with the 45 nm technical process will require the use of EUV lithography for four critical layers of masks, 193 nm equipment and even in some cases 248 nm scanners can be successfully used to work with the remaining 11 layers
Intel’s main task is to debug EUV equipment for processing critical values of the 45 nm process technology. Presumably, 157 nm equipment will be used with this process technology, although it may be possible to get by with only 193 nm tools
Next Generation 32nm process technology expected to roll out at Intel in 2021 will require EUV scanners and masks to process nine layers. Quite possible. that the industry will do without the introduction of tools of the 157 nm generation (Silverman put it this way: “high quality calcium fluoride [required for optical systems of 157 nm equipment] is still much more expensive than gold”). Only 10% of 193nm scanners, which have already started shipping, are equipped with calcium fluoride optics. At the same time, it is expected that due to technological features, 157 nm scanners will be equipped with such optics
High performance EUV systems will require more powerful lasers. The current best examples of xenon lasers have a power of about 10 W, while a power of about 100 or more watts is required
Another current problem facing the implementation of EUV installations is the lack of sensitivity of resists. The commercialization of EUV requires the development of photoresists with a sensitivity of 2 mJ
Currently the only supplier of EUV beta systems is ASML, however, Japanese Canon and Nikon also promise to start shipping their prototypes by 2021